Industry-University Cooperation Foundation Hanyang University Files United States Patent Application for Pellicle for EUV Lithography

Press/Media: Press / Media

Period2017 Feb 10

Media coverage

1

Media coverage

  • TitleIndustry-University Cooperation Foundation Hanyang University Files United States Patent Application for Pellicle for EUV Lithography
    Media name/outletGlobal IP News. Semiconductor Patent News
    Country/TerritoryIndia
    Date17/2/10
    PersonsSeung-Min Lee
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