Korean Intellectual Property Office Releases Samsung Display Co Ltd and Dongjin Semichem's Patent Application for Etchant and Fabrication Method of Metal Pattern and Thin Film Transistor Substrate Using the Same

Press/Media: Press / Media

Period2020 Aug 16

Media coverage

1

Media coverage

  • TitleKorean Intellectual Property Office Releases Samsung Display Co Ltd and Dongjin Semichem's Patent Application for Etchant and Fabrication Method of Metal Pattern and Thin Film Transistor Substrate Using the Same
    Media name/outletGlobal IP News. Semiconductor Patent News
    Country/TerritoryIndia
    Date20/8/16
    PersonsHyun Jae Kim