Microelectronic Res Institute of Chinese Academy of Sciences and Real Core Beijing Semiconductor Ltd Responsibility File Chinese Patent Application for Silicon Nitride Deposition Method and Manufacturing Method of Semiconductor Device

Press/Media: Press / Media

Period2023 Feb 21

Media coverage

1

Media coverage

  • TitleMicroelectronic Res Institute of Chinese Academy of Sciences and Real Core Beijing Semiconductor Ltd Responsibility File Chinese Patent Application for Silicon Nitride Deposition Method and Manufacturing Method of Semiconductor Device
    Media name/outletGlobal IP News. Semiconductor Patent News
    Country/TerritoryIndia
    Date23/2/21
    URLct.moreover.com/?a=50092735973&p=1gw&v=1&x=6QpHBMyQYcWF-IMrEXkPfg
    PersonsJung-Hyun Kim