Samsung Electronics Secures Patent on Method of Treating a Porous Dielectric Layer and a Method of Fabricating a Semiconductor Device Using the Same

Press/Media: Press / Media

Period2017 Feb 22

Media coverage

1

Media coverage

  • TitleSamsung Electronics Secures Patent on Method of Treating a Porous Dielectric Layer and a Method of Fabricating a Semiconductor Device Using the Same
    Media name/outletGlobal IP News. Semiconductor Patent News
    CountryIndia
    Date17/2/22
    PersonsSanghoon Lee