Samsung Electronics Seeks Patent for Photomask Method for Correcting Errors of Photomask Integrated Circuit Device Manufactured by Using Photomask and Method of Manufacturing the Integrated Circuit Device

Press/Media: Press / Media

Period2022 Oct 15

Media coverage

1

Media coverage

  • TitleSamsung Electronics Seeks Patent for Photomask Method for Correcting Errors of Photomask Integrated Circuit Device Manufactured by Using Photomask and Method of Manufacturing the Integrated Circuit Device
    Media name/outletGlobal IP News. Semiconductor Patent News
    Country/TerritoryIndia
    Date22/10/15
    URLct.moreover.com/?a=49010445164&p=1gw&v=1&x=CkD_ZKemcs3sdAG4Num9Lg
    PersonsHyun Jae Kim