United States Patent for Composition for Depositing Silicon-Containing Thin Film and Method for Producing Silicon-Containing Thin Film Using the Same Issued to DNF Co Ltd

Press/Media: Press / Media

Period2022 Jul 20

Media coverage

1

Media coverage

  • TitleUnited States Patent for Composition for Depositing Silicon-Containing Thin Film and Method for Producing Silicon-Containing Thin Film Using the Same Issued to DNF Co Ltd
    Media name/outletGlobal IP News. Optics & Imaging Patent News
    Country/TerritoryIndia
    Date22/7/20
    Personsjin woo Park