United States Patent for Oxide Thin Film, Method for Post-Treating Oxide Thin Film and Electronic Apparatus Issued to Industry-Academic Cooperation Foundation Yonsei University

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Period2016 Nov 1

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  • TitleUnited States Patent for Oxide Thin Film, Method for Post-Treating Oxide Thin Film and Electronic Apparatus Issued to Industry-Academic Cooperation Foundation Yonsei University
    Media name/outletGlobal IP News. Optics & Imaging Patent News
    Country/TerritoryIndia
    Date16/11/1
    PersonsHyun Woo Park
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