United States Patent for Pellicle for EUV Lithography Issued to Industry-University Cooperation Foundation Hanyang University

Press/Media: Press / Media

Period2018 May 1

Media coverage

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Media coverage

  • TitleUnited States Patent for Pellicle for EUV Lithography Issued to Industry-University Cooperation Foundation Hanyang University
    Media name/outletGlobal IP News. Semiconductor Patent News
    Country/TerritoryIndia
    Date18/5/1
    PersonsSeung-Min Lee
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