U.S. Patent and Trademark Office Publishes Samsung Electronics's Patent Application for Method of Treating a Porous Dielectric Layer and a Method of Fabricating a Semiconductor Device Using the Same

Press/Media: Press / Media

Period2016 May 26

Media coverage

1

Media coverage

  • TitleU.S. Patent and Trademark Office Publishes Samsung Electronics's Patent Application for Method of Treating a Porous Dielectric Layer and a Method of Fabricating a Semiconductor Device Using the Same
    Media name/outletGlobal IP News. Semiconductor Patent News
    CountryIndia
    Date16/5/26
    PersonsSanghoon Lee