US Patent Issued to DNF on July 19 for "Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same" (South Korean Inventors)

Press/Media: Press / Media

Period2022 Jul 19

Media coverage

2

Media coverage

  • TitleUS Patent Issued to DNF on July 19 for "Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date22/7/19
    Personsjin woo Park
  • TitleUS Patent Issued to DNF on July 19 for "Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date22/7/19
    Personsjin woo Park