US Patent Issued to DNF on June 14 for "Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition" (South Korean Inventors)

Press/Media: Press / Media

Period2022 Jun 15

Media coverage

1

Media coverage

  • TitleUS Patent Issued to DNF on June 14 for "Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date22/6/15
    Personsjin woo Park
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