US Patent Issued to INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY on Dec. 6 for "Non-phosphoric acid-based silicon nitride film etching composition and etching method using the same" (South Korean Inventors)

Press/Media: Press / Media

Period2022 Dec 7

Media coverage

1

Media coverage

  • TitleUS Patent Issued to INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY on Dec. 6 for "Non-phosphoric acid-based silicon nitride film etching composition and etching method using the same" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date22/12/7
    URLct.moreover.com/?a=49442232803&p=1gw&v=1&x=WSAHgUQjFIIBTcSVf3hm9Q
    PersonsSangwoo Lim