US Patent Issued to Korea Institute of Science and Technology on Nov. 19 for "High temperature solid oxide cell comprising diffusion barrier layer and method for manufacturing the same" (South Korean Inventors)

Press/Media: Press / Media

Period2019 Nov 19

Media coverage

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Media coverage

  • TitleUS Patent Issued to Korea Institute of Science and Technology on Nov. 19 for "High temperature solid oxide cell comprising diffusion barrier layer and method for manufacturing the same" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date19/11/19
    PersonsJongsup Hong
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