US Patent Issued to LG Chem on July 12 for "Block copolymer containing photo-sensitive moiety" (South Korean Inventors)

Press/Media: Press / Media

Period2022 Jul 13

Media coverage

1

Media coverage

  • TitleUS Patent Issued to LG Chem on July 12 for "Block copolymer containing photo-sensitive moiety" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date22/7/13
    Personsjin woo Park