US Patent Issued to SAMSUNG ELECTRONICS, Research & Business Foundation Sungkyunkwan University on Jan. 3 for "Method of forming transition metal dichalcogenide thin film" (South Korean Inventors)

Press/Media: Press / Media

Period	2023 Jan 21

Media coverage

Title	US Patent Issued to SAMSUNG ELECTRONICS, Research & Business Foundation Sungkyunkwan University on Jan. 3 for "Method of forming transition metal dichalcogenide thin film" (South Korean Inventors)
Media name/outlet	US Fed News
Country/Territory	United States
Date	23/1/21
URL	ct.moreover.com/?a=49807564697&p=1gw&v=1&x=o3y6j7IUOmTmq-Nvnkm4Aw
Persons	Sang-Woo Kim