US Patent Issued to SK hynix, UIF (University Industry Foundation), Yonsei University on Jan. 4 for "Marker layout method for optimizing overlay alignment in semiconductor device" (South Korean Inventors)

Press/Media: Press / Media

Period2022 Jan 5

Media coverage

1

Media coverage

  • TitleUS Patent Issued to SK hynix, UIF (University Industry Foundation), Yonsei University on Jan. 4 for "Marker layout method for optimizing overlay alignment in semiconductor device" (South Korean Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date22/1/5
    PersonsJae Yop Kim, Chang Ouk Kim