University College

Research Output 1999 2019

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Conference contribution
2009
2 Citations (Scopus)

Controlling etch properties of silicon-based anti-reflective spin-on hardmask materials

Kim, S. K., Cho, H. M., Woo, C., Koh, S. R., Kim, M. Y., Yoon, H. C., Lee, W., Shin, S. W., Kim, J. S. & Chang, T., 2009 May 29, Advances in Resist Materials and Processing Technology XXVI. Vol. 7273. 727313

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Silicon
silicon
Lithography
Optical Properties
Optical properties
2008
5 Citations (Scopus)

Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

Kim, S. K., Cho, H. M., Koh, S. R., Kim, M. Y., Yoon, H. C., Chung, Y. J., Kim, J. S. & Chang, T., 2008 Dec 15, Advances in Resist Materials and Processing Technology XXV. 69232Q. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6923).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Immersion Lithography
Silicon
Lithography
submerging
lithography