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Conference contribution
2008

Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

Kim, S. K., Cho, H. M., Koh, S. R., Kim, M. Y., Yoon, H. C., Chung, Y. J., Kim, J. S. & Chang, T., 2008 Dec 15, Advances in Resist Materials and Processing Technology XXV. 69232Q. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6923).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)
2009

Controlling etch properties of silicon-based anti-reflective spin-on hardmask materials

Kim, S. K., Cho, H. M., Woo, C., Koh, S. R., Kim, M. Y., Yoon, H. C., Lee, W., Shin, S. W., Kim, J. S. & Chang, T., 2009 May 29, Advances in Resist Materials and Processing Technology XXVI. 727313. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 7273).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)