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  • 2008

    Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

    Kim, S. K., Cho, H. M., Koh, S. R., Kim, M. Y., Yoon, H. C., Chung, Y. J., Kim, J. S. & Chang, T., 2008, Advances in Resist Materials and Processing Technology XXV. 69232Q. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6923).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Citations (Scopus)
  • 2009

    Controlling etch properties of silicon-based anti-reflective spin-on hardmask materials

    Kim, S. K., Cho, H. M., Woo, C., Koh, S. R., Kim, M. Y., Yoon, H. C., Lee, W., Shin, S. W., Kim, J. S. & Chang, T., 2009, Advances in Resist Materials and Processing Technology XXVI. 727313. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 7273).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)