• 2500 Citations
  • 25 h-Index
1990 …2019
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Fingerprint Dive into the research topics where Dae Hong Ko is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 4 Similar Profiles
annealing Physics & Astronomy
Annealing Engineering & Materials Science
Substrates Engineering & Materials Science
Silicon Chemical Compounds
Oxides Chemical Compounds
Chemical vapor deposition Engineering & Materials Science
silicates Physics & Astronomy
atomic layer epitaxy Physics & Astronomy

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Research Output 1990 2019

Analysis of anisotropic in-plane strain behavior in condensed Si1-xGex fin epitaxial layer using X-ray reciprocal space mapping

Jang, H., Kim, B., Koo, S., Choi, Y., Shin, C. S. & Ko, D. H., 2019 Mar 1, In : Japanese Journal of Applied Physics. 58, 3, 036502.

Research output: Contribution to journalArticle

plane strain
Epitaxial layers
fins
X rays
x rays

Effect of P Concentration on Ti Silicide Formation in In-Situ P Doped Epitaxial Si Films

Park, S., Shin, H., Ko, E. & Ko, D. H., 2019 May 22, In : Physica Status Solidi (A) Applications and Materials Science. 216, 10, 1800620.

Research output: Contribution to journalArticle

budgets
Phase transitions
occurrences
Transmission electron microscopy
X ray diffraction

Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition

Shin, D., Song, H., Jeong, J. E., Park, H. & Ko, D. H., 2019 Mar 1, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 37, 2, 020902.

Research output: Contribution to journalArticle

Atomic layer deposition
atomic layer epitaxy
Silicon Dioxide
heat treatment
Heat treatment

Effect of thermal annealing on the strain and microstructures of in-situ phosphorus-doped Si1−xCx films grown on blanket and patterned silicon wafers

Kim, S. W., Lee, M., Jang, H., Lee, H. J. & Ko, D. H., 2019 Jun 25, In : Journal of Alloys and Compounds. 790, p. 799-808 10 p.

Research output: Contribution to journalArticle

Silicon wafers
Phosphorus
Epilayers
Annealing
Microstructure

Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method

Song, H., Shin, D., Jeong, J. E., Park, H. & Ko, D. H., 2019 Mar 1, In : AIP Advances. 9, 3, 035333.

Research output: Contribution to journalArticle

atomic layer epitaxy
titanium oxides
productivity
titanium
physical properties