Engineering & Materials Science
Thin films
100%
Thin film transistors
95%
Ion beams
93%
Oxide films
71%
Ion beam assisted deposition
54%
Indium
54%
Liquid crystals
51%
Tin oxides
50%
Substrates
47%
Annealing
42%
Plasmas
41%
Carbon films
38%
Temperature
38%
Diffusion barriers
33%
Electrodes
33%
Organic light emitting diodes (OLED)
31%
Ohmic contacts
31%
Ions
31%
Zinc oxide
29%
Cathodes
28%
Electric properties
28%
Oxygen
26%
Metals
26%
Anodes
26%
Field emission
25%
Diamonds
25%
Amorphous carbon
24%
Carbon
23%
Oxides
21%
Gate dielectrics
20%
Nematic liquid crystals
20%
Liquid crystal displays
20%
Crystalline materials
19%
Buffer layers
19%
Surface treatment
18%
Atmospheric pressure
18%
Contact resistance
17%
Diamond films
17%
Chemical vapor deposition
17%
Magnetron sputtering
17%
Polysilicon
17%
Silicides
16%
Carbon nanotubes
15%
Irradiation
15%
Amorphous films
15%
Plasma enhanced chemical vapor deposition
15%
Fabrication
15%
Cerium oxide
14%
Sputtering
14%
Surface chemistry
14%
Physics & Astronomy
ion beams
68%
thin films
68%
transistors
43%
liquid crystals
39%
indium oxides
38%
tin oxides
38%
carbon
37%
alignment
36%
field emission
31%
electric contacts
29%
annealing
28%
cathodes
27%
light emitting diodes
23%
electrodes
22%
performance
21%
anodes
21%
diamonds
21%
vapor deposition
18%
oxide films
17%
low voltage
16%
ions
15%
electrical properties
14%
emitters
14%
diamond films
14%
contact resistance
14%
atmospheric pressure
14%
oxides
14%
nitrogen
13%
silicides
13%
oxygen
13%
temperature
11%
electric potential
11%
air
11%
carbon nanotubes
11%
silicon
11%
buffers
11%
microstructure
11%
capacitors
10%
leakage
10%
irradiation
10%
metals
9%
passivity
9%
aluminum
9%
polymers
9%
magnetron sputtering
9%
gases
9%
oxygen ions
9%
Chemistry
Liquid Film
59%
Ion Beam
53%
Dielectric Material
29%
Pentacene
26%
Annealing
24%
Diffusion Barrier
24%
Liquid Crystal
23%
Amorphous Material
21%
Contact Resistance
20%
Plasma
19%
Surface
17%
Anode
16%
Electrical Property
16%
Carbon Atom
15%
Behavior as Electrode
15%
Tin Oxide
14%
Oxide
13%
Dioxygen
12%
Diamond
12%
Magnetron Sputtering
12%
Alloy
12%
Amorphous Silicon
11%
Microstructure
11%
Metal Oxide
11%
Voltage
11%
Ambient Reaction Temperature
11%
Ion
10%
Surface Chemistry
10%
Single Walled Nanotube
10%
Zinc Oxide
10%
Field Effect
10%
Capacitor
10%
Field Emission
10%
Sputtering
9%
Compound Mobility
9%
Work Function
9%
Surface Modification
9%
Grain Boundary
9%
Nucleation
8%
Energy
8%
Silicon Oxide
8%
Chemical Passivation
8%
Deposition Process
8%
Multilayer
8%
Resistance
8%
Carbon Nanotube
7%
Pressure
7%
Solar Cell
7%
Leakage Current
7%