• 1031 Citations
  • 16 h-Index
1984 …2019
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Research Output 1984 2019

  • 1031 Citations
  • 16 h-Index
  • 104 Article
  • 27 Conference contribution
  • 6 Paper
  • 5 Conference article
2019

Plasmonic near-field scanning nanoscope with a cross-polarization detection technique

Shim, H. B. & Hahn, J. W., 2019 Oct 1, In : Nanophotonics. 8, 10, p. 1731-1738 8 p.

Research output: Contribution to journalArticle

Open Access
cross polarization
Signal-To-Noise Ratio
near fields
Polarization
Scanning

Quantitative analysis and modeling of line edge roughness in near-field lithography: Toward high pattern quality in nanofabrication

Han, D., Park, C., Oh, S., Jung, H. & Hahn, J. W., 2019 Jan 1, In : Nanophotonics. 8, 5, p. 879-888 10 p.

Research output: Contribution to journalArticle

Open Access
Nanostructures
nanofabrication
Nanotechnology
Lithography
quantitative analysis

Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light source

Park, C., Oh, S. & Hahn, J. W., 2019 Dec 1, In : Scientific reports. 9, 1, 8207.

Research output: Contribution to journalArticle

Open Access
Light
Equipment and Supplies
Physics
Hot Temperature
Metals
2018

Analytical model for designing a high-energy-efficiency granular double-layer X-ray scintillator with a diffuse reflection layer

Song, J., Shim, H. B. & Hahn, J. W., 2018 Aug 20, In : Optics Express. 26, 17, p. 21642-21655 14 p.

Research output: Contribution to journalArticle

scintillation counters
x rays
energy
reflectance
radiative transfer
3 Citations (Scopus)

Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulation

Oh, S., Han, D., Shim, H. B. & Hahn, J. W., 2018 Jan 26, In : Nanotechnology. 29, 4, 045301.

Research output: Contribution to journalArticle

Optical transfer function
Lithography
Pixels
Modulation
Convolution
atmospheric attenuation
Optical emission spectroscopy
flame temperature
Uncertainty analysis
optical emission spectroscopy
2017
1 Citation (Scopus)

Analytic solution of the radiative transfer equation for the analysis of the efficiency and spatial resolution of a granular X-ray scintillator

Shim, H. B., Song, J. & Hahn, J. W., 2017 Dec 25, In : Optics Express. 25, 26, p. 32686-32696 11 p.

Research output: Contribution to journalArticle

radiative transfer
scintillation counters
phosphors
spatial resolution
charge coupled devices
5 Citations (Scopus)
spherical waves
polaritons
apertures
surface geometry
root-mean-square errors
2 Citations (Scopus)
Aluminum
Silicon nitride
Membranes
Composite membranes
Lithography
3 Citations (Scopus)
Spectrometers
Gases
Infrared radiation
Graphite
Thermodynamics
4 Citations (Scopus)

Nanoscale 2.5-dimensional surface patterning with plasmonic lithography

Jung, H., Park, C., Oh, S. & Hahn, J. W., 2017 Dec 1, In : Scientific reports. 7, 1, 9721.

Research output: Contribution to journalArticle

lithography
spherical waves
root-mean-square errors
microbalances
polaritons
1 Citation (Scopus)

Pixel-based learning method for an optimized photomask in optical lithography

Jeong, M. & Hahn, J. W., 2017 Oct 1, In : Journal of Micro/ Nanolithography, MEMS, and MOEMS. 16, 4, 043504.

Research output: Contribution to journalArticle

Photomasks
photomasks
Photolithography
learning
Masks

Pseudo actinometry for the measurement of reactive species density

Kang, M., Ko, Y., Jang, I. Y., Jung, J. & Hahn, J. W., 2017 Apr 1, In : Optics Letters. 42, 7, p. 1420-1423 4 p.

Research output: Contribution to journalArticle

rare gases
actinometers
correlation coefficients
chlorine
plasma etching
1 Citation (Scopus)

Relative positioning method for near-field beam spot array with optical microscope image of lithographic patterns using linear regression

Oh, S., Jang, J. & Hahn, J. W., 2017 Feb 10, In : Applied Optics. 56, 5, p. 1346-1352 7 p.

Research output: Contribution to journalArticle

optical microscopes
Linear regression
positioning
regression analysis
near fields
43 Citations (Scopus)

Selective dual-band metamaterial perfect absorber for infrared stealth technology

Kim, J., Han, K. & Hahn, J. W., 2017 Dec 1, In : Scientific reports. 7, 1, 6740.

Research output: Contribution to journalArticle

stealth technology
absorbers
wavelengths
polaritons
metals
2016
3 Citations (Scopus)

Analytical calculation of the light-collection efficiency of an optical emission spectrometer with the effective solid-angle method

Kang, M. & Hahn, J. W., 2016 May 20, In : Applied Optics. 55, 15, p. 3909-3914 6 p.

Research output: Contribution to journalArticle

light emission
Spectrometers
spectrometers
Light sources
point sources
1 Citation (Scopus)

Calculating the threshold energy of the pulsed laser sintering of silver and copper nanoparticles

Lee, C. & Hahn, J. W., 2016 Oct, In : Journal of the Optical Society of Korea. 20, 5, p. 601-606 6 p.

Research output: Contribution to journalArticle

pulsed lasers
sintering
silver
copper
nanoparticles
1 Citation (Scopus)

Calibration of exposure dose for nanoscale plasmonic lithography with microsized far-field spot patterns

Han, D., Park, C., Jung, H. & Hahn, J. W., 2016 Jun 30, In : Journal of Micromechanics and Microengineering. 26, 9, 095001.

Research output: Contribution to journalArticle

Lithography
Calibration
Microscopes
System stability
Fabrication
4 Citations (Scopus)
Photoresists
dosage
Chucks
energy
Laser produced plasmas
1 Citation (Scopus)

Effect of Spectral Line Broadening and Instrument Function on the Spectrum of a Mid-Infrared Flare in a Realistic Environment

Han, K., Lee, W. & Hahn, J. W., 2016 Jul 2, In : Combustion Science and Technology. 188, 7, p. 1152-1164 13 p.

Research output: Contribution to journalArticle

flares
line spectra
Infrared radiation
shape functions
Angle measurement
3 Citations (Scopus)

Improvement in photomask critical dimension uniformity using etch selectivity control

Oh, C., Kang, M. & Hahn, J. W., 2016 Jan 1, In : Vacuum. 123, p. 76-81 6 p.

Research output: Contribution to journalArticle

Photomasks
photomasks
Chlorine
selectivity
chlorine

Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy

Junhwa-Jung, Kim, Y., Jang, I. Y., Kim, B. G., Jeon, C. U., Kang, M., Lee, C. & Hahn, J. W., 2016 Jan 1, Photomask Technology 2016. Kasprowicz, B. S. & Buck, P. D. (eds.). SPIE, Vol. 9985. 99851S

Research output: Chapter in Book/Report/Conference proceedingConference contribution

CD Uniformity
Photomasks
Photomask
Optical emission spectroscopy
photomasks
5 Citations (Scopus)
iteration
proximity
Identification (control systems)
layouts
Logic devices
2 Citations (Scopus)

Theoretical analysis of water droplet drying on different substrates on liquid crystal display panels heated with infrared radiation

Lee, C., Jang, J. & Hahn, J. W., 2016 Apr 3, In : Drying Technology. 34, 5, p. 557-562 6 p.

Research output: Contribution to journalArticle

infrared radiation
Liquid crystal displays
drying
Drying
liquid crystals
2015
2 Citations (Scopus)
Chlorine
Spectrometers
Plasmas
Photomasks
Signal interference

A mid-IR optical emission spectrometer with a PbSe array detector for analyzing spectral characteristic of IR flares

Lee, W., Kang, M. & Hahn, J. W., 2015 Jan 1, International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014. Nasution, A. (ed.). SPIE, 944415. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9444).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Flare
Mid-infrared
Spectrometer
flares
light emission

Development of optical inspection system for detecting malfunctions of digital micromirror device

Kang, M., Kang, D. W., Lee, W. & Hahn, J. W., 2015 Jan 1, International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014. Nasution, A. (ed.). SPIE, 944417. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9444).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Digital devices
malfunctions
Micromirror
Inspection
inspection
1 Citation (Scopus)

Keystone error analysis of projection optics in a maskless lithography system

Kang, D. W., Kang, M. & Hahn, J. W., 2015 Jan 1, In : International Journal of Precision Engineering and Manufacturing. 16, 2, p. 373-378 6 p.

Research output: Contribution to journalArticle

Error analysis
Lithography
Optics
Optical systems
Experiments
7 Citations (Scopus)

Plasmonic lithography for fabricating nanoimprint masters with multi-scale patterns

Jung, H., Kim, S., Han, D., Jang, J., Oh, S., Choi, J. H., Lee, E. S. & Hahn, J. W., 2015 May 1, In : Journal of Micromechanics and Microengineering. 25, 5, 055004.

Research output: Contribution to journalArticle

Lithography
Aspect ratio
Fluidics
Silicon
Masks
2014

A MID-IR optical emission spectrometer with a PbSe array detector for analyzing spectral characteristic of IR flares

Lee, W., Lee, H. & Hahn, J. W., 2014 Jan 1.

Research output: Contribution to conferencePaper

Spectrometers
Detectors
1 Citation (Scopus)
Stick-slip
Lithography
slip
roughness
lithography
7 Citations (Scopus)
Diffraction gratings
light emission
Spectrometers
Diffraction
gratings

Enhancing the image contrast of defect patterns in molded plastic cases of mobile phones with a digital image process

Lee, T., Tho, G., Oh, S. & Hahn, J. W., 2014 Dec 1, In : Advances in Polymer Technology. 33, S1, 21474.

Research output: Contribution to journalArticle

Mobile phones
Plastics
Defects
Visibility
Urethane
1 Citation (Scopus)

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Kang, D. W., Kang, M. & Hahn, J. W., 2014 Dec 20, In : Applied Optics. 53, 36, p. 8507-8513 7 p.

Research output: Contribution to journalArticle

Charge coupled devices
Lithography
lithography
charge coupled devices
Pixels
2 Citations (Scopus)

Model-based breakdown of resist and mask contributions to local CDU for sub-30-nm contact holes in EUV lithography

Kim, I., Park, C., Hwang, M., Yeo, J. H. & Hahn, J. W., 2014 Jul 1, In : Microelectronic Engineering. 123, p. 48-53 6 p.

Research output: Contribution to journalArticle

Extreme ultraviolet lithography
Masks
electric contacts
masks
lithography
3 Citations (Scopus)

Theoretical study on evaporation of sessile water droplets on a glass panel with infrared radiation

Jang, J., Lee, C. & Hahn, J. W., 2014 Jan 1, In : Journal of Mechanical Science and Technology. 28, 4, p. 1575-1580 6 p.

Research output: Contribution to journalArticle

Evaporation
Infrared radiation
Glass
Water
Electric lamps
2013
9 Citations (Scopus)

Accurate position measurement of a high-density beam spot array in digital maskless lithography

Kang, D. W., Kang, M. & Hahn, J. W., 2013 Aug 10, In : Applied Optics. 52, 23, p. 5862-5868 7 p.

Research output: Contribution to journalArticle

Position measurement
Charge coupled devices
Lithography
lithography
Pixels
16 Citations (Scopus)
Spectrum analysis
spectrum analysis
light emission
Spectrometers
signatures
8 Citations (Scopus)

Imaging heterogeneous nanostructures with a plasmonic resonant ridge aperture

Lee, T., Lee, E., Oh, S. & Hahn, J. W., 2013 Apr 12, In : Nanotechnology. 24, 14, 145502.

Research output: Contribution to journalArticle

Nanostructures
Scanning
Imaging techniques
Refractive index
Microscopes
2 Citations (Scopus)

Multifunctional bowtie-shaped ridge aperture fo overlay alignment in plasmonic direct writing lithography using a contact probe

Oh, S., Lee, T. & Hahn, J. W., 2013 Jul 1, In : Optics Letters. 38, 13, p. 2250-2252 3 p.

Research output: Contribution to journalArticle

ridges
lithography
apertures
alignment
probes
2 Citations (Scopus)
Plasma enhanced chemical vapor deposition
Spatial distribution
spatial distribution
Nitrogen
vapor deposition
2012
5 Citations (Scopus)
Uncertainty analysis
Spectrometers
Calibration
Graphite
Butane

Design of a high positioning contact probe for plasmonic lithography

Jang, J., Kim, Y., Kim, S., Jung, H. & Hahn, J. W., 2012 Jan 1, Alternative Lithographic Technologies IV. SPIE, 832322. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8323).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Plasmonics
Lithography
positioning
Positioning
Probe
42 Citations (Scopus)

Doubly resonant metallic nanostructure for high conversion efficiency of second harmonic generation

Park, S., Hahn, J. W. & Lee, J. Y., 2012 Feb 27, In : Optics Express. 20, 5, p. 4856-4870 15 p.

Research output: Contribution to journalArticle

harmonic generations
harmonics
augmentation
polaritons
apertures
1 Citation (Scopus)

High-resolution laser direct writing with a plasmonic contact probe

Jung, H., Kim, Y., Kim, S., Jang, J. & Hahn, J. W., 2012 Jan 1, Alternative Lithographic Technologies IV. SPIE, 83232A. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8323).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Plasmonics
Probe
High Resolution
Contact
Laser

Plasmonic lithography modeling and measurement of near-field distribution of plasmonic nano-aperture

Kim, Y., Kim, S., Jung, H., Jang, J., Lee, J. Y. & Hahn, J. W., 2012 Jan 1, Alternative Lithographic Technologies IV. SPIE, Vol. 8323. 832320

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Plasmonics
Photoresists
Near-field
Lithography
Photoresist
36 Citations (Scopus)

Resolution limit in plasmonic lithography for practical applications beyond 2x-nm half pitch

Kim, S., Jung, H., Kim, Y., Jang, J. & Hahn, J. W., 2012 Nov 20, In : Advanced Materials. 24, 44, p. OP337-OP344

Research output: Contribution to journalArticle

Lithography
Surface roughness
Molecular weight
Experiments
Temperature
1 Citation (Scopus)

The characteristic modes and structures of bluff-body stabilized flames in supersonic coflow air

Kim, J., Yoon, Y., Park, C. W. & Hahn, J. W., 2012 Oct 11, In : International Journal of Aeronautical and Space Sciences. 13, 3, p. 386-397 12 p.

Research output: Contribution to journalArticle

Air
Subsonic flow
Air entrainment
Supersonic flow
Jet fuel

Time-resolved absolute spectral analysis of IR countermeasure flares and its experimental validation by using an optical emission spectrometer with PbSe array detector

Lee, H., Oh, C. & Hahn, J. W., 2012 Aug 1, Next-Generation Spectroscopic Technologies V. 837408. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8374).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Flare
countermeasures
Experimental Validation
Countermeasures
Spectral Analysis
2011
15 Citations (Scopus)

Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal

Kim, Y., Jung, H., Kim, S., Jang, J., Lee, J. Y. & Hahn, J. W., 2011 Sep 26, In : Optics Express. 19, 20, p. 19296-19309 14 p.

Research output: Contribution to journalArticle

near fields
lithography
photoresists
profiles
metals