• 1028 Citations
  • 16 h-Index
1984 …2019
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Research Output 1984 2019

  • 1028 Citations
  • 16 h-Index
  • 104 Article
  • 27 Conference contribution
  • 6 Paper
  • 5 Conference article
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Article
2019

Plasmonic near-field scanning nanoscope with a cross-polarization detection technique

Shim, H. B. & Hahn, J. W., 2019 Oct 1, In : Nanophotonics. 8, 10, p. 1731-1738 8 p.

Research output: Contribution to journalArticle

Open Access
cross polarization
Signal-To-Noise Ratio
near fields
Polarization
Scanning

Quantitative analysis and modeling of line edge roughness in near-field lithography: Toward high pattern quality in nanofabrication

Han, D., Park, C., Oh, S., Jung, H. & Hahn, J. W., 2019 Jan 1, In : Nanophotonics. 8, 5, p. 879-888 10 p.

Research output: Contribution to journalArticle

Open Access
Nanostructures
nanofabrication
Nanotechnology
Lithography
quantitative analysis

Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light source

Park, C., Oh, S. & Hahn, J. W., 2019 Dec 1, In : Scientific reports. 9, 1, 8207.

Research output: Contribution to journalArticle

Open Access
Light
Equipment and Supplies
Physics
Hot Temperature
Metals
2018

Analytical model for designing a high-energy-efficiency granular double-layer X-ray scintillator with a diffuse reflection layer

Song, J., Shim, H. B. & Hahn, J. W., 2018 Aug 20, In : Optics Express. 26, 17, p. 21642-21655 14 p.

Research output: Contribution to journalArticle

scintillation counters
x rays
energy
reflectance
radiative transfer
3 Citations (Scopus)

Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulation

Oh, S., Han, D., Shim, H. B. & Hahn, J. W., 2018 Jan 26, In : Nanotechnology. 29, 4, 045301.

Research output: Contribution to journalArticle

Optical transfer function
Lithography
Pixels
Modulation
Convolution
atmospheric attenuation
Optical emission spectroscopy
flame temperature
Uncertainty analysis
optical emission spectroscopy
2017
1 Citation (Scopus)

Analytic solution of the radiative transfer equation for the analysis of the efficiency and spatial resolution of a granular X-ray scintillator

Shim, H. B., Song, J. & Hahn, J. W., 2017 Dec 25, In : Optics Express. 25, 26, p. 32686-32696 11 p.

Research output: Contribution to journalArticle

radiative transfer
scintillation counters
phosphors
spatial resolution
charge coupled devices
5 Citations (Scopus)
spherical waves
polaritons
apertures
surface geometry
root-mean-square errors
2 Citations (Scopus)
Aluminum
Silicon nitride
Membranes
Composite membranes
Lithography
3 Citations (Scopus)
Spectrometers
Gases
Infrared radiation
Graphite
Thermodynamics
4 Citations (Scopus)

Nanoscale 2.5-dimensional surface patterning with plasmonic lithography

Jung, H., Park, C., Oh, S. & Hahn, J. W., 2017 Dec 1, In : Scientific reports. 7, 1, 9721.

Research output: Contribution to journalArticle

lithography
spherical waves
root-mean-square errors
microbalances
polaritons
1 Citation (Scopus)

Pixel-based learning method for an optimized photomask in optical lithography

Jeong, M. & Hahn, J. W., 2017 Oct 1, In : Journal of Micro/ Nanolithography, MEMS, and MOEMS. 16, 4, 043504.

Research output: Contribution to journalArticle

Photomasks
photomasks
Photolithography
learning
Masks

Pseudo actinometry for the measurement of reactive species density

Kang, M., Ko, Y., Jang, I. Y., Jung, J. & Hahn, J. W., 2017 Apr 1, In : Optics Letters. 42, 7, p. 1420-1423 4 p.

Research output: Contribution to journalArticle

rare gases
actinometers
correlation coefficients
chlorine
plasma etching
1 Citation (Scopus)

Relative positioning method for near-field beam spot array with optical microscope image of lithographic patterns using linear regression

Oh, S., Jang, J. & Hahn, J. W., 2017 Feb 10, In : Applied Optics. 56, 5, p. 1346-1352 7 p.

Research output: Contribution to journalArticle

optical microscopes
Linear regression
positioning
regression analysis
near fields
42 Citations (Scopus)

Selective dual-band metamaterial perfect absorber for infrared stealth technology

Kim, J., Han, K. & Hahn, J. W., 2017 Dec 1, In : Scientific reports. 7, 1, 6740.

Research output: Contribution to journalArticle

stealth technology
absorbers
wavelengths
polaritons
metals
2016
3 Citations (Scopus)

Analytical calculation of the light-collection efficiency of an optical emission spectrometer with the effective solid-angle method

Kang, M. & Hahn, J. W., 2016 May 20, In : Applied Optics. 55, 15, p. 3909-3914 6 p.

Research output: Contribution to journalArticle

light emission
Spectrometers
spectrometers
Light sources
point sources
1 Citation (Scopus)

Calculating the threshold energy of the pulsed laser sintering of silver and copper nanoparticles

Lee, C. & Hahn, J. W., 2016 Oct, In : Journal of the Optical Society of Korea. 20, 5, p. 601-606 6 p.

Research output: Contribution to journalArticle

pulsed lasers
sintering
silver
copper
nanoparticles
1 Citation (Scopus)

Calibration of exposure dose for nanoscale plasmonic lithography with microsized far-field spot patterns

Han, D., Park, C., Jung, H. & Hahn, J. W., 2016 Jun 30, In : Journal of Micromechanics and Microengineering. 26, 9, 095001.

Research output: Contribution to journalArticle

Lithography
Calibration
Microscopes
System stability
Fabrication
4 Citations (Scopus)
Photoresists
dosage
Chucks
energy
Laser produced plasmas
1 Citation (Scopus)

Effect of Spectral Line Broadening and Instrument Function on the Spectrum of a Mid-Infrared Flare in a Realistic Environment

Han, K., Lee, W. & Hahn, J. W., 2016 Jul 2, In : Combustion Science and Technology. 188, 7, p. 1152-1164 13 p.

Research output: Contribution to journalArticle

flares
line spectra
Infrared radiation
shape functions
Angle measurement
3 Citations (Scopus)

Improvement in photomask critical dimension uniformity using etch selectivity control

Oh, C., Kang, M. & Hahn, J. W., 2016 Jan 1, In : Vacuum. 123, p. 76-81 6 p.

Research output: Contribution to journalArticle

Photomasks
photomasks
Chlorine
selectivity
chlorine
5 Citations (Scopus)
iteration
proximity
Identification (control systems)
layouts
Logic devices
2 Citations (Scopus)

Theoretical analysis of water droplet drying on different substrates on liquid crystal display panels heated with infrared radiation

Lee, C., Jang, J. & Hahn, J. W., 2016 Apr 3, In : Drying Technology. 34, 5, p. 557-562 6 p.

Research output: Contribution to journalArticle

infrared radiation
Liquid crystal displays
drying
Drying
liquid crystals
2015
2 Citations (Scopus)
Chlorine
Spectrometers
Plasmas
Photomasks
Signal interference
1 Citation (Scopus)

Keystone error analysis of projection optics in a maskless lithography system

Kang, D. W., Kang, M. & Hahn, J. W., 2015 Jan 1, In : International Journal of Precision Engineering and Manufacturing. 16, 2, p. 373-378 6 p.

Research output: Contribution to journalArticle

Error analysis
Lithography
Optics
Optical systems
Experiments
7 Citations (Scopus)

Plasmonic lithography for fabricating nanoimprint masters with multi-scale patterns

Jung, H., Kim, S., Han, D., Jang, J., Oh, S., Choi, J. H., Lee, E. S. & Hahn, J. W., 2015 May 1, In : Journal of Micromechanics and Microengineering. 25, 5, 055004.

Research output: Contribution to journalArticle

Lithography
Aspect ratio
Fluidics
Silicon
Masks
2014
1 Citation (Scopus)
Stick-slip
Lithography
slip
roughness
lithography
7 Citations (Scopus)
Diffraction gratings
light emission
Spectrometers
Diffraction
gratings

Enhancing the image contrast of defect patterns in molded plastic cases of mobile phones with a digital image process

Lee, T., Tho, G., Oh, S. & Hahn, J. W., 2014 Dec 1, In : Advances in Polymer Technology. 33, S1, 21474.

Research output: Contribution to journalArticle

Mobile phones
Plastics
Defects
Visibility
Urethane
1 Citation (Scopus)

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Kang, D. W., Kang, M. & Hahn, J. W., 2014 Dec 20, In : Applied Optics. 53, 36, p. 8507-8513 7 p.

Research output: Contribution to journalArticle

Charge coupled devices
Lithography
lithography
charge coupled devices
Pixels
2 Citations (Scopus)

Model-based breakdown of resist and mask contributions to local CDU for sub-30-nm contact holes in EUV lithography

Kim, I., Park, C., Hwang, M., Yeo, J. H. & Hahn, J. W., 2014 Jul 1, In : Microelectronic Engineering. 123, p. 48-53 6 p.

Research output: Contribution to journalArticle

Extreme ultraviolet lithography
Masks
electric contacts
masks
lithography
3 Citations (Scopus)

Theoretical study on evaporation of sessile water droplets on a glass panel with infrared radiation

Jang, J., Lee, C. & Hahn, J. W., 2014 Jan 1, In : Journal of Mechanical Science and Technology. 28, 4, p. 1575-1580 6 p.

Research output: Contribution to journalArticle

Evaporation
Infrared radiation
Glass
Water
Electric lamps
2013
9 Citations (Scopus)

Accurate position measurement of a high-density beam spot array in digital maskless lithography

Kang, D. W., Kang, M. & Hahn, J. W., 2013 Aug 10, In : Applied Optics. 52, 23, p. 5862-5868 7 p.

Research output: Contribution to journalArticle

Position measurement
Charge coupled devices
Lithography
lithography
Pixels
16 Citations (Scopus)
Spectrum analysis
spectrum analysis
light emission
Spectrometers
signatures
8 Citations (Scopus)

Imaging heterogeneous nanostructures with a plasmonic resonant ridge aperture

Lee, T., Lee, E., Oh, S. & Hahn, J. W., 2013 Apr 12, In : Nanotechnology. 24, 14, 145502.

Research output: Contribution to journalArticle

Nanostructures
Scanning
Imaging techniques
Refractive index
Microscopes
2 Citations (Scopus)

Multifunctional bowtie-shaped ridge aperture fo overlay alignment in plasmonic direct writing lithography using a contact probe

Oh, S., Lee, T. & Hahn, J. W., 2013 Jul 1, In : Optics Letters. 38, 13, p. 2250-2252 3 p.

Research output: Contribution to journalArticle

ridges
lithography
apertures
alignment
probes
2 Citations (Scopus)
Plasma enhanced chemical vapor deposition
Spatial distribution
spatial distribution
Nitrogen
vapor deposition
2012
5 Citations (Scopus)
Uncertainty analysis
Spectrometers
Calibration
Graphite
Butane
42 Citations (Scopus)

Doubly resonant metallic nanostructure for high conversion efficiency of second harmonic generation

Park, S., Hahn, J. W. & Lee, J. Y., 2012 Feb 27, In : Optics Express. 20, 5, p. 4856-4870 15 p.

Research output: Contribution to journalArticle

harmonic generations
harmonics
augmentation
polaritons
apertures
36 Citations (Scopus)

Resolution limit in plasmonic lithography for practical applications beyond 2x-nm half pitch

Kim, S., Jung, H., Kim, Y., Jang, J. & Hahn, J. W., 2012 Nov 20, In : Advanced Materials. 24, 44, p. OP337-OP344

Research output: Contribution to journalArticle

Lithography
Surface roughness
Molecular weight
Experiments
Temperature
1 Citation (Scopus)

The characteristic modes and structures of bluff-body stabilized flames in supersonic coflow air

Kim, J., Yoon, Y., Park, C. W. & Hahn, J. W., 2012 Oct 11, In : International Journal of Aeronautical and Space Sciences. 13, 3, p. 386-397 12 p.

Research output: Contribution to journalArticle

Air
Subsonic flow
Air entrainment
Supersonic flow
Jet fuel
2011
15 Citations (Scopus)

Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal

Kim, Y., Jung, H., Kim, S., Jang, J., Lee, J. Y. & Hahn, J. W., 2011 Sep 26, In : Optics Express. 19, 20, p. 19296-19309 14 p.

Research output: Contribution to journalArticle

near fields
lithography
photoresists
profiles
metals

A high transmission power stabilizer using brewster window for a UV pulsed laser in long-term drift

Lee, H., Ryoo, H. & Hahn, J. W., 2011 Aug 1, In : Journal of Mechanical Science and Technology. 25, 8, p. 2121-2125 5 p.

Research output: Contribution to journalArticle

Excimer lasers
Light transmission
Photodiodes
Power transmission
Pulsed lasers
9 Citations (Scopus)

Analysis of the effective reflectance of digital micromirror devices and process parameters for maskless photolithography

Ryoo, H., Kang, D. W. & Hahn, J. W., 2011 Mar 1, In : Microelectronic Engineering. 88, 3, p. 235-239 5 p.

Research output: Contribution to journalArticle

Digital devices
Photolithography
photolithography
Diffraction efficiency
reflectance
14 Citations (Scopus)

Analysis of the line pattern width and exposure efficiency in maskless lithography using a digital micromirror device

Ryoo, H., Kang, D. W. & Hahn, J. W., 2011 Oct 1, In : Microelectronic Engineering. 88, 10, p. 3145-3149 5 p.

Research output: Contribution to journalArticle

Digital devices
Lithography
lithography
radii
Numerical analysis
7 Citations (Scopus)

Design of a contact probe with high positioning accuracy for plasmonic lithography

Jang, J., Kim, Y., Kim, S., Jung, H. & Hahn, J. W., 2011 Mar 1, In : Scanning. 33, 2, p. 99-105 7 p.

Research output: Contribution to journalArticle

Lithography
positioning
lithography
probes
deflection
5 Citations (Scopus)

Sub-micro to nanometer scale laser direct writing techniques with a contact probe

Jung, H., Kim, Y., Kim, S., Jang, J. & Hahn, J. W., 2011 Oct 1, In : International Journal of Precision Engineering and Manufacturing. 12, 5, p. 877-883 7 p.

Research output: Contribution to journalArticle

Lasers
Fabrication
Photonics
Lenses
Scanning
2010
12 Citations (Scopus)

Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma

Oh, C., Ryoo, H., Lee, H., Kim, S. Y., Yi, H. J. & Hahn, J. W., 2010 Oct 1, In : Review of Scientific Instruments. 81, 10, 103109.

Research output: Contribution to journalArticle

light emission
Spectrometers
spectrometers
Semiconductor materials
Plasmas
2009
31 Citations (Scopus)

Plasmonic data storage medium with metallic nano-aperture array embedded in dielectric material

Park, S. & Hahn, J. W., 2009 Jan 1, In : Optics Express. 17, 22, p. 20203-20210 8 p.

Research output: Contribution to journalArticle

data storage
apertures
ridges
rays
thresholds
75 Citations (Scopus)

Plasmonic nano lithography with a high scan speed contact probe

Kim, Y., Kim, S., Jung, H., Lee, E. & Hahn, J. W., 2009 Jan 1, In : Optics Express. 17, 22, p. 19476-19485 10 p.

Research output: Contribution to journalArticle

lithography
probes
photoresists
silica glass
friction