• 2120 Citations
  • 24 h-Index
19962020

Research output per year

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Research Output

  • 2120 Citations
  • 24 h-Index
  • 92 Article
  • 7 Conference contribution
  • 3 Conference article
  • 1 Paper
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Conference contribution
2019

Effect of SiO2 etching inhibitor to H3PO4 for the selective Si3N4 wet etching of 3D NAND

Kim, T., Son, C., Park, T. & Lim, S., 2019 Jan 1, 16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019. Saga, K., Mertens, P. W., Hattori, T., Ruzyllo, J. & Muscat, A. J. (eds.). 2 ed. Electrochemical Society Inc., p. 137-142 6 p. (ECS Transactions; vol. 92, no. 2).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2018

Effect of surface preparation on the residual oxide thickness and material loss of InGaAs layer

Na, J. & Lim, S., 2018 Jan 1, ECS Transactions. Timans, P. J., Kakushima, K., Karim, Z., Gusev, E. P., Jagannathan, H., De Gendt, S. & Roozeboom, F. (eds.). 6 ed. Electrochemical Society Inc., p. 105-108 4 p. (ECS Transactions; vol. 85, no. 6).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ion implanted photoresist removal by material loss-free organic solvent

Oh, E. & Lim, S., 2018 Jan 1, Ultra Clean Processing of Semiconductor Surfaces XIV. Heyns, M., Meuris, M., Meuris, M. & Mertens, P. (eds.). Trans Tech Publications Ltd, p. 52-56 5 p. (Solid State Phenomena; vol. 282 SSP).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Is highly selective si3n4/sio2 etching feasible without phosphoric acid?

Son, C., Kim, T., Park, T. & Lim, S., 2018 Jan 1, Ultra Clean Processing of Semiconductor Surfaces XIV. Heyns, M., Meuris, M., Meuris, M. & Mertens, P. (eds.). Trans Tech Publications Ltd, p. 147-151 5 p. (Solid State Phenomena; vol. 282 SSP).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Toward the surface preparation of ingaas for the future cmos integration

Lim, S., 2018 Jan 1, Ultra Clean Processing of Semiconductor Surfaces XIV. Heyns, M., Meuris, M., Meuris, M. & Mertens, P. (eds.). Trans Tech Publications Ltd, p. 39-42 4 p. (Solid State Phenomena; vol. 282 SSP).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2005

Ultra-thin gate dielectric reliability projections

Moosa, M., Haggag, A., Liu, N., Kalpat, S., Kuffler, M., Menke, D., Abramowitz, P., Ramón, M. E., Tseng, H. H., Luo, T. Y., Lim, S., Grudowski, P., Jiang, J., Min, B. W., Weintraub, C., Chen, J., Wong, S., Paquette, C., Anderson, G., Tobin, P. J. & 2 others, White, B. E. & Mendicino, M., 2005 Oct 10, 2005 International Conference on Integrated Circuit Design and Technology, ICICDT. p. 129-133 5 p. F3. (2005 International Conference on Integrated Circuit Design and Technology, ICICDT).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)
2001

Control of ozonated water cleaning process for photoresist removal

Lim, S. & Chidsey, C. E. D., 2001 Jan 1, Ultra Clean Processing of Silicon Surfaces 2000. Heyns, M., Mertens, P. & Meuris, M. (eds.). Trans Tech Publications Ltd, p. 215-218 4 p. (Solid State Phenomena; vol. 76-77).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)