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Research Output 1996 2020

  • 2072 Citations
  • 24 h-Index
  • 92 Article
  • 6 Conference contribution
  • 3 Conference article
  • 1 Paper
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Conference contribution
2001
2 Citations (Scopus)

Control of ozonated water cleaning process for photoresist removal

Lim, S. & Chidsey, C. E. D., 2001 Jan 1, Ultra Clean Processing of Silicon Surfaces 2000. Heyns, M., Mertens, P. & Meuris, M. (eds.). Trans Tech Publications Ltd, p. 215-218 4 p. (Solid State Phenomena; vol. 76-77).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Photoresists
Cleaning
Water
2005
1 Citation (Scopus)

Ultra-thin gate dielectric reliability projections

Moosa, M., Haggag, A., Liu, N., Kalpat, S., Kuffler, M., Menke, D., Abramowitz, P., Ramón, M. E., Tseng, H. H., Luo, T. Y., Lim, S., Grudowski, P., Jiang, J., Min, B. W., Weintraub, C., Chen, J., Wong, S., Paquette, C., Anderson, G., Tobin, P. J. & 2 others, White, B. E. & Mendicino, M., 2005 Oct 10, 2005 International Conference on Integrated Circuit Design and Technology, ICICDT. p. 129-133 5 p. F3. (2005 International Conference on Integrated Circuit Design and Technology, ICICDT).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Gate dielectrics
Transistors
Dielectric devices
Dielectric films
Benchmarking
2018

Effect of surface preparation on the residual oxide thickness and material loss of InGaAs layer

Na, J. & Lim, S., 2018 Jan 1, ECS Transactions. Timans, P. J., Kakushima, K., Karim, Z., Gusev, E. P., Jagannathan, H., De Gendt, S. & Roozeboom, F. (eds.). 6 ed. Electrochemical Society Inc., p. 105-108 4 p. (ECS Transactions; vol. 85, no. 6).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Gallium arsenide
Indium
Oxides
Oxidation
Etching

Ion implanted photoresist removal by material loss-free organic solvent

Oh, E. & Lim, S., 2018 Jan 1, Ultra Clean Processing of Semiconductor Surfaces XIV. Heyns, M., Meuris, M., Meuris, M. & Mertens, P. (eds.). Trans Tech Publications Ltd, p. 52-56 5 p. (Solid State Phenomena; vol. 282 SSP).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Photoresists
photoresists
Organic solvents
Dimethyl Sulfoxide
Acetonitrile

Is highly selective si3n4/sio2 etching feasible without phosphoric acid?

Son, C., Kim, T., Park, T. & Lim, S., 2018 Jan 1, Ultra Clean Processing of Semiconductor Surfaces XIV. Heyns, M., Meuris, M., Meuris, M. & Mertens, P. (eds.). Trans Tech Publications Ltd, p. 147-151 5 p. (Solid State Phenomena; vol. 282 SSP).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

etchants
phosphoric acid
Phosphoric acid
Etching
selectivity

Toward the surface preparation of ingaas for the future cmos integration

Lim, S., 2018 Jan 1, Ultra Clean Processing of Semiconductor Surfaces XIV. Heyns, M., Meuris, M., Meuris, M. & Mertens, P. (eds.). Trans Tech Publications Ltd, p. 39-42 4 p. (Solid State Phenomena; vol. 282 SSP).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

preparation
Passivation
passivity
Lattice mismatch
Wet etching