35.2: High-performance solution-processed oxide TFT with dual channel at low temperature

Woong Hee Jeong, Kyung Min Kim, Dong Lim Kim, You Seung Rim, Hyun Jae Kim, Kyung Bae Park, Myung Kwan Ryu

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

In this study, we investigated solution-processed oxide thin film transistors (TFTs) with dual channel (DC) at 350°C. The DC TFTs consisted of thin InZnO (IZO) channel and thick AlInZnO (AIZO) channel. The IZO could provide high carrier concentration to enhance the charge transport for high saturation mobility (μsat) and thick AIZO channel could also regulate the conductance for proper threshold voltage (Vth). The resistivity of front IZO thin films could be determined by composition ratio of In/Zn and thickness of IZO channel. Thus, we can demonstrate excellent device with sat of 5.02 cm2/Vs, Vth of 0.35 V, and on/off ratio of over 106 at 350°C.

Original languageEnglish
Pages (from-to)476-478
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume42 1
DOIs
Publication statusPublished - 2011 Jun

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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