Abstract
The intrinsic properties of initially p-type doped graphene (grown by chemical vapor deposition (CVD)) can be recovered by buffered oxide etch (BOE) treatment, and the dominant factor governing p-type doping is identified as the H 2O/O 2 redox system. Semi-ionic C-F bonding prevents the reaction between the products of the H 2O/O 2 redox system and graphene. BOE-treated graphene field effect transistors (FETs) subsequently exposed to air, became p-type doped due to recovery of the H 2O/O 2 redox system. In comparison, poly(methyl methacrylate) (PMMA)-coated graphene FETs had improved stability for maintaining the intrinsic graphene electronic properties.
Original language | English |
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Pages (from-to) | 7781-7788 |
Number of pages | 8 |
Journal | ACS Nano |
Volume | 6 |
Issue number | 9 |
DOIs | |
Publication status | Published - 2012 Sept 25 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Engineering(all)
- Physics and Astronomy(all)