A micromachined finite coplanar line-to-silicon micromachined waveguide transition for millimeter and submillimeter wave applications

Yongshik Lee; James P. Becker; Jack R. East; Linda P.B. Katehi

doi:10.1109/MWSYM.2002.1012228

A micromachined finite coplanar line-to-silicon micromachined waveguide transition for millimeter and submillimeter wave applications

Yongshik Lee, James P. Becker, Jack R. East, Linda P.B. Katehi

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article

3 Citations (Scopus)

Abstract

A finite ground coplanar (FGC) line-to-waveguide transition utilizing a novel, free-standing printed E-plane probe has been demonstrated in W-band (75-110GHz). One way to improve the performance of such a transition and to extend its utility well into the submillimeter range is to thin the supporting substrate beneath the probe. This paper presents the W-band performance of a fully micromachined finite ground coplanar line-to-silicon diamond waveguide transition with the substrate beneath the probe entirely removed, thus forming a free-stranding metal structure.

Original language	English
Pages (from-to)	1871-1874
Number of pages	4
Journal	IEEE MTT-S International Microwave Symposium Digest
Volume	3
DOIs	https://doi.org/10.1109/MWSYM.2002.1012228
Publication status	Published - 2002 Jan 1

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All Science Journal Classification (ASJC) codes

Radiation
Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

Lee, Y., Becker, J. P., East, J. R., & Katehi, L. P. B. (2002). A micromachined finite coplanar line-to-silicon micromachined waveguide transition for millimeter and submillimeter wave applications. IEEE MTT-S International Microwave Symposium Digest, 3, 1871-1874. https://doi.org/10.1109/MWSYM.2002.1012228

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Access to Document

10.1109/MWSYM.2002.1012228