A novel method for forming gate spacer and its effects on the W/WN x/Poly-si gate stack

Yong Soo Kim, Kwan Yong Lim, Jae Geun Oh, Se Aug Jang, Heung Jae Cho, Jun Mo Yang, Jai Bum Suh, Su Ock Chung, Soo Young Park, Hong Seon Yang, Hyun Chul Sohn, Jin Woong Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

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Engineering & Materials Science