A printable form of silicon for high performance thin film transistors on plastic substrates

E. Menard, K. J. Lee, D. Y. Khang, R. G. Nuzzo, J. A. Rogers

Research output: Contribution to journalArticlepeer-review

289 Citations (Scopus)

Abstract

The fabrication of free-standing micro- and nanoscale objects of single crystal silicon from silicon-on-insulator wafers by lithographic patterning of resist was investigated. It is observed that large collection of such objects constitutes a type of material which could be deposited and patterned using dry transfer printing. The effective mobilities of devices built with this material known as microstructured silicon are also demonstrated to be as high as 180 cm 2/V on plastic substrates. The results show that 'top down' microtechnology represents an attractive route to high performance flexible electronic systems.

Original languageEnglish
Pages (from-to)5398-5400
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number26
DOIs
Publication statusPublished - 2004 Jun 28

Bibliographical note

Funding Information:
We thank M. Kane for useful discussions. The work was partially supported by the Defense Advanced Projects Agency and by the U.S. Department of Energy under Grant No. DEFG02-91-ER45439. D.-Y.K. thanks the Korea Science and Engineering Foundation (KOSEF) for post-doctoral fellowship support.

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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