A simple and rapid formation of wet chemical etched silicon nanowire films at the air-water interface

Tae Il Lee, Won Jin Choi, Kyeong Ju Moon, Ji Hyuk Choi, Jee Ho Park, Unyong Jeong, Hong Koo Baik, Jae Min Myoung

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A spontaneous assembly route to form a thin film of nanowires (NWs) was demonstrated and its feasibility was confirmed through the fabrication of a high-performance multi-Si NW field effect transistor (FET) using this route. Governed by the three mechanisms of spreading, trapping, and two-dimensional packing, the route was optimized for the concentration of Si NWs and the initial volume ratio of aqueous hydrochloride solution to isopropyl alcohol. The successfully formed Si NW thin-film was transferred on a flat polydimethylsiloxane (PDMS) mold and regulated using a repeatable conformal contact method with a new flat PDMS to prepare it for decal printing on an organic dielectric layer. Finally, after depositing the source and drain electrodes on the printed active layer, a high-performance 23-bridged Si NW FET exhibiting a μeff of 51.4 cm2 V-1 s -1, an on/off drain current ratio of 105, and a V th of -2.7 V was obtained.

Original languageEnglish
Pages (from-to)14203-14208
Number of pages6
JournalJournal of Materials Chemistry
Volume21
Issue number37
DOIs
Publication statusPublished - 2011 Oct 7

Fingerprint

Silicon
Nanowires
Water
Air
Polydimethylsiloxane
Field effect transistors
Thin films
2-Propanol
Drain current
Printing
Alcohols
Fabrication
Electrodes
baysilon

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

Cite this

Lee, Tae Il ; Choi, Won Jin ; Moon, Kyeong Ju ; Choi, Ji Hyuk ; Park, Jee Ho ; Jeong, Unyong ; Baik, Hong Koo ; Myoung, Jae Min. / A simple and rapid formation of wet chemical etched silicon nanowire films at the air-water interface. In: Journal of Materials Chemistry. 2011 ; Vol. 21, No. 37. pp. 14203-14208.
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A simple and rapid formation of wet chemical etched silicon nanowire films at the air-water interface. / Lee, Tae Il; Choi, Won Jin; Moon, Kyeong Ju; Choi, Ji Hyuk; Park, Jee Ho; Jeong, Unyong; Baik, Hong Koo; Myoung, Jae Min.

In: Journal of Materials Chemistry, Vol. 21, No. 37, 07.10.2011, p. 14203-14208.

Research output: Contribution to journalArticle

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