A study for the bias control of indium-tin-oxide films synthesized by cesium assisted radio frequency magnetron sputtering

Deuk Yeon Lee, Se Jong Lee, Kie Moon Song, Hong Koo Baik

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Abstract

ITO films were deposited by rf cesium assisted rf plasma sputtering with substrate bias at room temperature. The optimum data of specific resistivity and XRD were obtained in the case of applying to -100 V of negative substrate bias at 0.02 A of target current. In this condition, 4.4X10-4 Ω cm of specific resistivity and 84.3% of transmittance of 550 nm were obtained.

Original languageEnglish
Pages (from-to)1069-1072
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number4
DOIs
Publication statusPublished - 2003 Jul 1

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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