A study for the bias control of indium-tin-oxide films synthesized by cesium assisted radio frequency magnetron sputtering

Deuk Yeon Lee, Se Jong Lee, Kie Moon Song, Hong Koo Baik

Research output: Contribution to journalArticle

12 Citations (Scopus)


ITO films were deposited by rf cesium assisted rf plasma sputtering with substrate bias at room temperature. The optimum data of specific resistivity and XRD were obtained in the case of applying to -100 V of negative substrate bias at 0.02 A of target current. In this condition, 4.4X10-4 Ω cm of specific resistivity and 84.3% of transmittance of 550 nm were obtained.

Original languageEnglish
Pages (from-to)1069-1072
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number4
Publication statusPublished - 2003 Jul 1


All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this