A study of the image quality in a lossy NFSL

Kwangchil Lee, Kyoungsik Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Recently, the near-field superlens (NFSL) based on the negative permittivity (ε < 0) has been much attraction issue because of its useful application in a near-field imaging system beyond the diffraction limits. Silver in the UV region and silicon carbide in the mid-IR regime has been reported as suitable materials for the NFSL. However, these materials have the intrinsic absorption loss, which blurs the near-field image. In this research, we theoretically predict enhancement of image quality in a lossy NFSL system using the full-wave numerical approach and electrostatic approximation method. As a result, we recognized that an unmatched NFSL has better image quality compared to the traditional match NFSL.

Original languageEnglish
Title of host publicationMetamaterials
Subtitle of host publicationFundamentals and Applications II
Volume7392
DOIs
Publication statusPublished - 2009 Nov 2
EventMetamaterials: Fundamentals and Applications II - San Diego, CA, United States
Duration: 2009 Aug 22009 Aug 5

Other

OtherMetamaterials: Fundamentals and Applications II
CountryUnited States
CitySan Diego, CA
Period09/8/209/8/5

Fingerprint

Near-field
Image Quality
Image quality
near fields
Silver
Silicon carbide
Imaging systems
Electrostatics
Permittivity
Diffraction
Mid-infrared
Imaging System
Approximation Methods
silicon carbides
carbides
attraction
Silicon
Absorption
Enhancement
silver

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Lee, K., & Kim, K. (2009). A study of the image quality in a lossy NFSL. In Metamaterials: Fundamentals and Applications II (Vol. 7392). [73921E] https://doi.org/10.1117/12.826796
Lee, Kwangchil ; Kim, Kyoungsik. / A study of the image quality in a lossy NFSL. Metamaterials: Fundamentals and Applications II. Vol. 7392 2009.
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Lee, K & Kim, K 2009, A study of the image quality in a lossy NFSL. in Metamaterials: Fundamentals and Applications II. vol. 7392, 73921E, Metamaterials: Fundamentals and Applications II, San Diego, CA, United States, 09/8/2. https://doi.org/10.1117/12.826796

A study of the image quality in a lossy NFSL. / Lee, Kwangchil; Kim, Kyoungsik.

Metamaterials: Fundamentals and Applications II. Vol. 7392 2009. 73921E.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Lee K, Kim K. A study of the image quality in a lossy NFSL. In Metamaterials: Fundamentals and Applications II. Vol. 7392. 2009. 73921E https://doi.org/10.1117/12.826796