Ab Initio Thermodynamics of Surface Oxide Structures under Controlled Growth Conditions

Taehun Lee, Yonghyuk Lee, Simone Piccinin, Aloysius Soon

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Having a robust and predictive ab initio thermodynamic model to examine and describe the interplay of the oxygen gas and evaporated metal atoms on another metal substrate may prove to be very helpful in understanding the surface phase diagrams of these oxygen/metal systems. In this work, we examine the O/Cu/Au(111) system and provide a refined atomistic thermodynamic model which takes different definitions of the chemical potential of the less abundant metal, Cu into account. We argue that the latter highly depends on the various surface structures (overlayers and alloys) that forms on the metal substrate under growth conditions. We demonstrate that our improved thermodynamic model rationalizes new experimentally observed oxide structures and may pave a systematic way to predict new surface structures of reduced stoichiometries, which would otherwise be missed by the common practice of taking only the bulk limits.

Original languageEnglish
Pages (from-to)2228-2233
Number of pages6
JournalJournal of Physical Chemistry C
Volume121
Issue number4
DOIs
Publication statusPublished - 2017 Feb 2

Fingerprint

Oxides
Metals
Thermodynamics
thermodynamics
oxides
metals
Surface structure
Oxygen
Chemical potential
oxygen
Substrates
Stoichiometry
Phase diagrams
stoichiometry
Gases
phase diagrams
Atoms
gases
atoms

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

Cite this

Lee, Taehun ; Lee, Yonghyuk ; Piccinin, Simone ; Soon, Aloysius. / Ab Initio Thermodynamics of Surface Oxide Structures under Controlled Growth Conditions. In: Journal of Physical Chemistry C. 2017 ; Vol. 121, No. 4. pp. 2228-2233.
@article{572a0604606f4d5186de0f70e193873b,
title = "Ab Initio Thermodynamics of Surface Oxide Structures under Controlled Growth Conditions",
abstract = "Having a robust and predictive ab initio thermodynamic model to examine and describe the interplay of the oxygen gas and evaporated metal atoms on another metal substrate may prove to be very helpful in understanding the surface phase diagrams of these oxygen/metal systems. In this work, we examine the O/Cu/Au(111) system and provide a refined atomistic thermodynamic model which takes different definitions of the chemical potential of the less abundant metal, Cu into account. We argue that the latter highly depends on the various surface structures (overlayers and alloys) that forms on the metal substrate under growth conditions. We demonstrate that our improved thermodynamic model rationalizes new experimentally observed oxide structures and may pave a systematic way to predict new surface structures of reduced stoichiometries, which would otherwise be missed by the common practice of taking only the bulk limits.",
author = "Taehun Lee and Yonghyuk Lee and Simone Piccinin and Aloysius Soon",
year = "2017",
month = "2",
day = "2",
doi = "10.1021/acs.jpcc.6b11445",
language = "English",
volume = "121",
pages = "2228--2233",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "4",

}

Ab Initio Thermodynamics of Surface Oxide Structures under Controlled Growth Conditions. / Lee, Taehun; Lee, Yonghyuk; Piccinin, Simone; Soon, Aloysius.

In: Journal of Physical Chemistry C, Vol. 121, No. 4, 02.02.2017, p. 2228-2233.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Ab Initio Thermodynamics of Surface Oxide Structures under Controlled Growth Conditions

AU - Lee, Taehun

AU - Lee, Yonghyuk

AU - Piccinin, Simone

AU - Soon, Aloysius

PY - 2017/2/2

Y1 - 2017/2/2

N2 - Having a robust and predictive ab initio thermodynamic model to examine and describe the interplay of the oxygen gas and evaporated metal atoms on another metal substrate may prove to be very helpful in understanding the surface phase diagrams of these oxygen/metal systems. In this work, we examine the O/Cu/Au(111) system and provide a refined atomistic thermodynamic model which takes different definitions of the chemical potential of the less abundant metal, Cu into account. We argue that the latter highly depends on the various surface structures (overlayers and alloys) that forms on the metal substrate under growth conditions. We demonstrate that our improved thermodynamic model rationalizes new experimentally observed oxide structures and may pave a systematic way to predict new surface structures of reduced stoichiometries, which would otherwise be missed by the common practice of taking only the bulk limits.

AB - Having a robust and predictive ab initio thermodynamic model to examine and describe the interplay of the oxygen gas and evaporated metal atoms on another metal substrate may prove to be very helpful in understanding the surface phase diagrams of these oxygen/metal systems. In this work, we examine the O/Cu/Au(111) system and provide a refined atomistic thermodynamic model which takes different definitions of the chemical potential of the less abundant metal, Cu into account. We argue that the latter highly depends on the various surface structures (overlayers and alloys) that forms on the metal substrate under growth conditions. We demonstrate that our improved thermodynamic model rationalizes new experimentally observed oxide structures and may pave a systematic way to predict new surface structures of reduced stoichiometries, which would otherwise be missed by the common practice of taking only the bulk limits.

UR - http://www.scopus.com/inward/record.url?scp=85027026471&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85027026471&partnerID=8YFLogxK

U2 - 10.1021/acs.jpcc.6b11445

DO - 10.1021/acs.jpcc.6b11445

M3 - Article

AN - SCOPUS:85027026471

VL - 121

SP - 2228

EP - 2233

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 4

ER -