Aligning capabilities of a nematic liquid crystal on treated SiO x thin-film layers by electron beam evaporation

Hyung Ku Kang, Jin Woo Han, Soo Hee Kang, Jong Hwan Kim, Young Hwan Kim, Jeoung Yeon Hwang, Dae Shik Seo

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We studied liquid crystal (LC) aligning capabilities on a treated SiO x thin-film surface by 45° evaporation with an electron beam system. A uniform vertical LC alignment on SiOx thin-film surfaces was achieved. A high pretilt angle of about 86.5° was obtained. A good LC alignment on treated SiOx thin-film layers by 45° evaporation with electron beam was also observed at an annealing temperature of 250°C. The high pretilt angle and the good thermal stability of LC alignment on SiOx thin-films by 45° obliqued electron beam evaporation can be achieved.

Original languageEnglish
Pages (from-to)7050-7052
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number9 A
DOIs
Publication statusPublished - 2006 Sep 7

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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