Alignment effects for nematic liquid crystal using a-C:H thin film as working gas at bias condition

J. Y. Hwang, C. J. Park, D. S. Seo, H. J. Ahn, K. C. Kim, H. K. Baik

Research output: Contribution to journalArticlepeer-review

Abstract

We investigated the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30 W rf bias condition. A high pretilt angle by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250°C, and the alignment defect was observed above annealing temperature of 300°C.

Original languageEnglish
Pages (from-to)31-34
Number of pages4
JournalFerroelectrics
Volume304
DOIs
Publication statusPublished - 2004 Jan 1

Bibliographical note

Funding Information:
This work was supported by National Research Laboratory program (M1-0203-00-0008).

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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