Alignment effects for nematic liquid crystal using a-C:H thin film as working gas at bias condition

J. Y. Hwang, C. J. Park, Dae-Shik Seo, H. J. Ahn, K. C. Kim, Hong Koo Baik

Research output: Contribution to journalArticle

Abstract

We investigated the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30 W rf bias condition. A high pretilt angle by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250°C, and the alignment defect was observed above annealing temperature of 300°C.

Original languageEnglish
Pages (from-to)31-34
Number of pages4
JournalFerroelectrics
Volume304
DOIs
Publication statusPublished - 2004 Jan 1

Fingerprint

Nematic liquid crystals
Gases
liquid crystals
alignment
Thin films
thin films
gases
Ion beams
ion beams
Annealing
annealing
Temperature
Defects
temperature
defects

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

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abstract = "We investigated the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30 W rf bias condition. A high pretilt angle by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250°C, and the alignment defect was observed above annealing temperature of 300°C.",
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Alignment effects for nematic liquid crystal using a-C:H thin film as working gas at bias condition. / Hwang, J. Y.; Park, C. J.; Seo, Dae-Shik; Ahn, H. J.; Kim, K. C.; Baik, Hong Koo.

In: Ferroelectrics, Vol. 304, 01.01.2004, p. 31-34.

Research output: Contribution to journalArticle

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