Analyses of pattern quality in roll-to-roll digital maskless lithography with positional errors

Changmin Lee, Yunhyeok Ko, Jae W. Hahn

Research output: Contribution to journalArticlepeer-review

Abstract

In roll-to-roll digital maskless lithography (R2R DML) equipment, it is difficult to achieve high quality, owing to surface deformation that affects the pattern position. To address this issue, we simulated the patterning results of R2R DML to analyze the relationship between positional errors and pattern quality. Errors perpendicular to the pattern direction exhibited a 1.3–2 times greater effect on the linewidth and line edge roughness compared to those parallel to this direction. We confirmed that positioning errors could lead to defects in which the photoresists were not fully exposed. Finally, through simulations, we found that the effect of positional errors could be reduced by controlling the array spot separation length.

Original languageEnglish
Pages (from-to)3250-3256
Number of pages7
JournalApplied Optics
Volume60
Issue number11
DOIs
Publication statusPublished - 2021 Apr

Bibliographical note

Funding Information:
Funding. Basic Research Fund of the Korea Institute of Machinery and Materials (NK230E).

Publisher Copyright:
© 2021 Optical Society of America.

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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