Analysis of inter-symbol-interference caused by shift misalignment of two objective lenses in high-NA micro holographic storage

Cheol Ki Min; Do Hyung Kim; Sungbin Jeon; Kyoung Su Park; Young Pil Park; Hyunseok Yang; No Cheol Park; Jaegeun Kim

doi:10.1007/s00542-012-1600-3

Analysis of inter-symbol-interference caused by shift misalignment of two objective lenses in high-NA micro holographic storage

Cheol Ki Min, Do Hyung Kim, Sungbin Jeon, Kyoung Su Park, Young Pil Park, Hyunseok Yang, No Cheol Park, Jaegeun Kim

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A high-numerical-aperture (NA) optical system with narrower recording distance in transverse direction is required to increase the areal-density in micro holographic storage. When the first data is recorded by shift misalignment of the two objective lenses (OLs) in transverse direction, the second data can cause inter-symbol-interference (ISI) by pre-recorded first data. A tolerance analysis in transverse direction is required because shift misalignment of the two OLs causes ISI and reduces the total-density. This research analyzes the effects of ISI using a 0.85 NA and 320 nm recording distance between two microgratings in adjacent region. We define the recording tolerance of a single micrograting and the calculate total-density based on blu-ray disc specifications while considering the shift errors. Finally, we define the recording tolerance of successively recorded microgratings in adjacent region and propose recording distance for avoiding ISI.

Original language	English
Pages (from-to)	1623-1631
Number of pages	9
Journal	Microsystem Technologies
Volume	18
Issue number	9-10
DOIs	https://doi.org/10.1007/s00542-012-1600-3
Publication status	Published - 2012 Sept

Bibliographical note

Funding Information:
This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2011-0027349).

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Hardware and Architecture
Electrical and Electronic Engineering

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10.1007/s00542-012-1600-3

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title = "Analysis of inter-symbol-interference caused by shift misalignment of two objective lenses in high-NA micro holographic storage",

abstract = "A high-numerical-aperture (NA) optical system with narrower recording distance in transverse direction is required to increase the areal-density in micro holographic storage. When the first data is recorded by shift misalignment of the two objective lenses (OLs) in transverse direction, the second data can cause inter-symbol-interference (ISI) by pre-recorded first data. A tolerance analysis in transverse direction is required because shift misalignment of the two OLs causes ISI and reduces the total-density. This research analyzes the effects of ISI using a 0.85 NA and 320 nm recording distance between two microgratings in adjacent region. We define the recording tolerance of a single micrograting and the calculate total-density based on blu-ray disc specifications while considering the shift errors. Finally, we define the recording tolerance of successively recorded microgratings in adjacent region and propose recording distance for avoiding ISI.",

author = "Min, {Cheol Ki} and Kim, {Do Hyung} and Sungbin Jeon and Park, {Kyoung Su} and Park, {Young Pil} and Hyunseok Yang and Park, {No Cheol} and Jaegeun Kim",

note = "Funding Information: This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2011-0027349).",

year = "2012",

month = sep,

doi = "10.1007/s00542-012-1600-3",

language = "English",

volume = "18",

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journal = "Microsystem Technologies",

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AU - Min, Cheol Ki

AU - Kim, Do Hyung

AU - Jeon, Sungbin

AU - Park, Kyoung Su

AU - Park, Young Pil

AU - Yang, Hyunseok

AU - Park, No Cheol

AU - Kim, Jaegeun

N1 - Funding Information: This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2011-0027349).

PY - 2012/9

Y1 - 2012/9

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AB - A high-numerical-aperture (NA) optical system with narrower recording distance in transverse direction is required to increase the areal-density in micro holographic storage. When the first data is recorded by shift misalignment of the two objective lenses (OLs) in transverse direction, the second data can cause inter-symbol-interference (ISI) by pre-recorded first data. A tolerance analysis in transverse direction is required because shift misalignment of the two OLs causes ISI and reduces the total-density. This research analyzes the effects of ISI using a 0.85 NA and 320 nm recording distance between two microgratings in adjacent region. We define the recording tolerance of a single micrograting and the calculate total-density based on blu-ray disc specifications while considering the shift errors. Finally, we define the recording tolerance of successively recorded microgratings in adjacent region and propose recording distance for avoiding ISI.

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Analysis of inter-symbol-interference caused by shift misalignment of two objective lenses in high-NA micro holographic storage

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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