Analysis of inter-symbol-interference caused by shift misalignment of two objective lenses in high-NA micro holographic storage

Cheol Ki Min, Do Hyung Kim, Sungbin Jeon, Kyoung Su Park, Young Pil Park, Hyunseok Yang, No Cheol Park, Jaegeun Kim

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

A high-numerical-aperture (NA) optical system with narrower recording distance in transverse direction is required to increase the areal-density in micro holographic storage. When the first data is recorded by shift misalignment of the two objective lenses (OLs) in transverse direction, the second data can cause inter-symbol-interference (ISI) by pre-recorded first data. A tolerance analysis in transverse direction is required because shift misalignment of the two OLs causes ISI and reduces the total-density. This research analyzes the effects of ISI using a 0.85 NA and 320 nm recording distance between two microgratings in adjacent region. We define the recording tolerance of a single micrograting and the calculate total-density based on blu-ray disc specifications while considering the shift errors. Finally, we define the recording tolerance of successively recorded microgratings in adjacent region and propose recording distance for avoiding ISI.

Original languageEnglish
Pages (from-to)1623-1631
Number of pages9
JournalMicrosystem Technologies
Volume18
Issue number9-10
DOIs
Publication statusPublished - 2012 Sep

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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