Analysis of layers and interfaces in a multi-layer system and schematic simulation using angle-resolved X-ray photoelectron spectroscopy

Sun Gyu Choi, Hyung Ho Park, Hyeongtag Jeon, Ho Jung Chang

Research output: Contribution to journalArticle

Abstract

Standardization of an analytical procedure for bonding structure and thickness simulation of nanoscaled ultra thin films was established using the theoretical background of angle-resolved X-ray photoelectron spectroscopy (ARXPS). A structure simulation using ARXPS was designed and a software program with java language was provided for application to a high-k dielectric multilayer system. A thickness simulation was applied to a high-k dielectric layer on semiconductor system of about 2-3 nm Gd2O3/GaAs and compared to experimental results. Multilayer structure of high-k binary oxide system (HfO2 and Al2O3) was simulated by photoelectron flux ratio change and their multilayer stacking structures were analyzed with different each layer thickness.

Original languageEnglish
Pages (from-to)2398-2401
Number of pages4
JournalJournal of Computational and Theoretical Nanoscience
Volume6
Issue number11
DOIs
Publication statusPublished - 2009 Nov 1

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All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Computational Mathematics
  • Electrical and Electronic Engineering

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