In plasmonic lithography, when using a scanning probe in contact mode, degradation of the line pattern quality occasionally occurs due to variations of probe tip velocity or a stick/slipmotion. To avoid poor pattern quality caused by such variations in probe tip motion, we analyzed the motion of the probe tip by using a frictional model based on conventional contact mechanics. The motion of the probe tip was numerically analyzed in terms of adhesion force and probe velocity, which are the dominant factors inmicro/nanoscale motion. It was found that stick/slip spacing has a roughly positive relationship with the maximum adhesion force between the substrate and probe tip, and a negative relationship with the probe velocity. Combining the probe tip motion with the exposure model of a near-field wave, we analyzed the quality of line patterns that resulted fromvarious stick/slip spacing in terms of lineedge roughness.
|Journal||Journal of Micro/ Nanolithography, MEMS, and MOEMS|
|Publication status||Published - 2014 Oct 1|
Bibliographical notePublisher Copyright:
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE). © 2014 SPIE.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Mechanical Engineering
- Electrical and Electronic Engineering