Analysis of line-edge roughness due to the stick/slip motion of a contact-mode scanning probe in plasmonic lithography

Changhoon Park, Jinhee Jang, Jae Won Hahn

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In plasmonic lithography, when using a scanning probe in contact mode, degradation of the line pattern quality occasionally occurs due to variations of probe tip velocity or a stick/slipmotion. To avoid poor pattern quality caused by such variations in probe tip motion, we analyzed the motion of the probe tip by using a frictional model based on conventional contact mechanics. The motion of the probe tip was numerically analyzed in terms of adhesion force and probe velocity, which are the dominant factors inmicro/nanoscale motion. It was found that stick/slip spacing has a roughly positive relationship with the maximum adhesion force between the substrate and probe tip, and a negative relationship with the probe velocity. Combining the probe tip motion with the exposure model of a near-field wave, we analyzed the quality of line patterns that resulted fromvarious stick/slip spacing in terms of lineedge roughness.

Original languageEnglish
Article number043020
JournalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Issue number4
Publication statusPublished - 2014 Oct 1


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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