Anodic Imprint Lithography: Direct Imprinting of Single Crystalline GaAs with Anodic Stamp

Kyunghwan Kim, Bugeun Ki, Keorock Choi, Jungwoo Oh

Research output: Contribution to journalArticle

Abstract

Anodic imprint lithography patterns the GaAs substrate electrochemically by applying a voltage through a predefined anodic stamp. This newly devised technique performs anodic etching in a stamping manner. Stamps that serve as anodic electrodes are fabricated precisely, and the patterns can be imprinted continuously on GaAs substrates. The anodic current locally oxidizes the GaAs through the metal attached to the stamp, and the GaAs oxides are subsequently removed by an acid in the solution. The process is simplified because the metal catalyst is not left on the substrate and the use of an oxidizing agent is not required. Anodic imprint lithography integrates the lithography and etching steps without the use of a polymer resist. Predefined anodic stamps with fin, pillar, and mesh arrays clearly imprinted trenches, holes, and embossed disk arrays on the GaAs substrates, respectively. Anodic imprints replace photons and electrons in conventional lithography with electrochemical stamping, which can simplify existing techniques that are highly complex for extreme nanopatterning.

Original languageEnglish
JournalACS Nano
DOIs
Publication statusAccepted/In press - 2019 Jan 1

Fingerprint

Lithography
lithography
Crystalline materials
stamping
Stamping
Substrates
Etching
etching
Metals
fins
metals
mesh
Photons
Oxidants
Oxides
Polymers
catalysts
Electrodes
acids
Catalysts

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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abstract = "Anodic imprint lithography patterns the GaAs substrate electrochemically by applying a voltage through a predefined anodic stamp. This newly devised technique performs anodic etching in a stamping manner. Stamps that serve as anodic electrodes are fabricated precisely, and the patterns can be imprinted continuously on GaAs substrates. The anodic current locally oxidizes the GaAs through the metal attached to the stamp, and the GaAs oxides are subsequently removed by an acid in the solution. The process is simplified because the metal catalyst is not left on the substrate and the use of an oxidizing agent is not required. Anodic imprint lithography integrates the lithography and etching steps without the use of a polymer resist. Predefined anodic stamps with fin, pillar, and mesh arrays clearly imprinted trenches, holes, and embossed disk arrays on the GaAs substrates, respectively. Anodic imprints replace photons and electrons in conventional lithography with electrochemical stamping, which can simplify existing techniques that are highly complex for extreme nanopatterning.",
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Anodic Imprint Lithography : Direct Imprinting of Single Crystalline GaAs with Anodic Stamp. / Kim, Kyunghwan; Ki, Bugeun; Choi, Keorock; Oh, Jungwoo.

In: ACS Nano, 01.01.2019.

Research output: Contribution to journalArticle

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