Application of a dielectric discontinuity microscope to process development at the Fairchild Research Cent. of Natl. Semiconductor

Robert W. Allison, Euisik Yoon, James G. Heard, Ronald P. Kovacs, Silvia Liddicoat, Kenneth J. Radigan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A new type of microscope (DDM) has been applied to submicron process development at the Fairchild Research Center. This high resolution video microscope produces an image which is the superposition of a dielectric discontinuity (phase contrast) and an absorptive optical image. With this instrument a Sparrow's resolution of 0.08 μm has been achieved at magnifications from 1150 times to 18,000 times. VIA and contact clearing have been observed from 0.1 μm to 1.4 μm at aspect ratios of up to 3:1. CD measurements have been made on both latent images and developed images and the results used to optimize the exposure energy for an I-line stepper. The DDM has also been used to visualize defects which are not visible with conventional microscopy. Both metallic and dielectric contaminant films have been detected and a submicron dielectric sidewall has been visualized on an advanced interconnect system. Material deposited during development using the MIMMI process has been observed. A simplified phase contrast transition theory is presented and applied to the observations.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherPubl by Int Soc for Optical Engineering
Pages419-431
Number of pages13
ISBN (Print)081940828X
Publication statusPublished - 1992
EventIntegrated Circuit Metrology, Inspection, and Process Control VI - San Jose, CA, USA
Duration: 1992 Mar 91992 Mar 11

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1673
ISSN (Print)0277-786X

Conference

ConferenceIntegrated Circuit Metrology, Inspection, and Process Control VI
CitySan Jose, CA, USA
Period92/3/992/3/11

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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