Application of organic/inorganic hybrid photopolymer to fabricate ultra-high-density patterned substrate

Jiseok Lim; Michael Popall; Shinill Kang

doi:10.1109/TMAG.2009.2016472

Application of organic/inorganic hybrid photopolymer to fabricate ultra-high-density patterned substrate

Jiseok Lim, Michael Popall, Shinill Kang

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The UV nano imprinting process is a promising technology to fabricate nano patterns at low cost and high throughput. To adopt the UV nano imprinting process for production of nano patterned substrates for patterned media, the replicated polymer layer must fulfill certain requirements of the patterned media. In this research, a UV nano imprinting process using an organic/inorganic hybrid photopolymer was developed and the replicated ultra-high-density patterned substrate was evaluated. A silicon mold with full track of nano patterns with pattern size of 35 nm diameter, 70 nm pitch was used. The geometrical properties, surface hardness and adhesion property with magnetic layer of the organic/inorganic hybrid photopolymer patterned substrate were analyzed.

Original language	English
Article number	4816015
Pages (from-to)	2300-2303
Number of pages	4
Journal	IEEE Transactions on Magnetics
Volume	45
Issue number	5
DOIs	https://doi.org/10.1109/TMAG.2009.2016472
Publication status	Published - 2009 May

Bibliographical note

Funding Information:
ACKNOWLEDGMENT This work was supported by the Korea Science and Engineering Foundation (KOSEF) under a grant funded by the Korea government (MOST) (No.R0A-2004-000-10368-0).

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/TMAG.2009.2016472

Cite this

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abstract = "The UV nano imprinting process is a promising technology to fabricate nano patterns at low cost and high throughput. To adopt the UV nano imprinting process for production of nano patterned substrates for patterned media, the replicated polymer layer must fulfill certain requirements of the patterned media. In this research, a UV nano imprinting process using an organic/inorganic hybrid photopolymer was developed and the replicated ultra-high-density patterned substrate was evaluated. A silicon mold with full track of nano patterns with pattern size of 35 nm diameter, 70 nm pitch was used. The geometrical properties, surface hardness and adhesion property with magnetic layer of the organic/inorganic hybrid photopolymer patterned substrate were analyzed.",

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Application of organic/inorganic hybrid photopolymer to fabricate ultra-high-density patterned substrate

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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