Application of organic/inorganic hybrid photopolymer to fabricate ultra-high-density patterned substrate

Jiseok Lim, Michael Popall, Shinill Kang

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The UV nano imprinting process is a promising technology to fabricate nano patterns at low cost and high throughput. To adopt the UV nano imprinting process for production of nano patterned substrates for patterned media, the replicated polymer layer must fulfill certain requirements of the patterned media. In this research, a UV nano imprinting process using an organic/inorganic hybrid photopolymer was developed and the replicated ultra-high-density patterned substrate was evaluated. A silicon mold with full track of nano patterns with pattern size of 35 nm diameter, 70 nm pitch was used. The geometrical properties, surface hardness and adhesion property with magnetic layer of the organic/inorganic hybrid photopolymer patterned substrate were analyzed.

Original languageEnglish
Article number4816015
Pages (from-to)2300-2303
Number of pages4
JournalIEEE Transactions on Magnetics
Volume45
Issue number5
DOIs
Publication statusPublished - 2009 May 1

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Photopolymers
Substrates
Silicon
Surface properties
Polymers
Adhesion
Hardness
Throughput
Costs

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

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Application of organic/inorganic hybrid photopolymer to fabricate ultra-high-density patterned substrate. / Lim, Jiseok; Popall, Michael; Kang, Shinill.

In: IEEE Transactions on Magnetics, Vol. 45, No. 5, 4816015, 01.05.2009, p. 2300-2303.

Research output: Contribution to journalArticle

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