Application of solid immersion lens-based near-field recording technology to high-speed plasmonic nanolithography

Kyoung Su Park, Taeseob Kim, Won Sup Lee, Hang Eun Joe, Byung Kwon Min, Young Pil Park, Hyunseok Yang, Sung Mook Kang, No Cheol Park

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

In this paper, we proposed a high-speed and high-throughput plasmonic nanolithography technique that uses a fabricated sharp-ridged nanoaperture on a solid immersion lens (SIL) and a precise active nanogap control algorithm. This plasmonic lithography with high throughput can make an optical spot with a diameter of the order of 10nm and can perform nanopatterning at sub-m/s speed. An optical high-throughput head was designed on a metallic aluminum aperture by optimizing the geometric parameters of a sharp-ridged antenna on the basis of the optical intensity and spot size. Using the evanescent field generated from the SIL, the plasmonic SIL could be maintained below 20nm above a photoresist-coated Si-wafer and could move at a speed of greater than 200 mm/s without friction; the patterning of lines could be performed under this condition. We achieved patterning with a line width (full-width at half-magnitude, FWHM) of 130 nm.

Original languageEnglish
Article number08JF01
JournalJapanese journal of applied physics
Volume51
Issue number8 PART 3
DOIs
Publication statusPublished - 2012 Aug

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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