Application of solid immersion lens-based near-field recording technology to high-speed plasmonic nanolithography

Kyoung Su Park, Taeseob Kim, Won Sup Lee, Hang Eun Joe, Byung-Kwon Min, Young Pil Park, Hyun Seok Yang, Sung Mook Kang, No Cheol Park

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

In this paper, we proposed a high-speed and high-throughput plasmonic nanolithography technique that uses a fabricated sharp-ridged nanoaperture on a solid immersion lens (SIL) and a precise active nanogap control algorithm. This plasmonic lithography with high throughput can make an optical spot with a diameter of the order of 10nm and can perform nanopatterning at sub-m/s speed. An optical high-throughput head was designed on a metallic aluminum aperture by optimizing the geometric parameters of a sharp-ridged antenna on the basis of the optical intensity and spot size. Using the evanescent field generated from the SIL, the plasmonic SIL could be maintained below 20nm above a photoresist-coated Si-wafer and could move at a speed of greater than 200 mm/s without friction; the patterning of lines could be performed under this condition. We achieved patterning with a line width (full-width at half-magnitude, FWHM) of 130 nm.

Original languageEnglish
Article number08JF01
JournalJapanese Journal of Applied Physics
Volume51
Issue number8 PART 3
DOIs
Publication statusPublished - 2012 Aug 1

Fingerprint

Nanolithography
submerging
Lenses
near fields
recording
lenses
Throughput
high speed
Evanescent fields
active control
Photoresists
photoresists
Linewidth
Lithography
friction
lithography
antennas
apertures
wafers
Friction

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Park, Kyoung Su ; Kim, Taeseob ; Lee, Won Sup ; Joe, Hang Eun ; Min, Byung-Kwon ; Park, Young Pil ; Yang, Hyun Seok ; Kang, Sung Mook ; Park, No Cheol. / Application of solid immersion lens-based near-field recording technology to high-speed plasmonic nanolithography. In: Japanese Journal of Applied Physics. 2012 ; Vol. 51, No. 8 PART 3.
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Application of solid immersion lens-based near-field recording technology to high-speed plasmonic nanolithography. / Park, Kyoung Su; Kim, Taeseob; Lee, Won Sup; Joe, Hang Eun; Min, Byung-Kwon; Park, Young Pil; Yang, Hyun Seok; Kang, Sung Mook; Park, No Cheol.

In: Japanese Journal of Applied Physics, Vol. 51, No. 8 PART 3, 08JF01, 01.08.2012.

Research output: Contribution to journalArticle

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