Application of solid immersion lens based near-field recording technology to high speed nano patterning

No Cheol Park, Byung Kwon Min, Young Pil Park, Hyunseok Yang, Kyoung Su Park, Sung Mook Kang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper, we present a low-cost and high-throughput approach to maskless nanolithography that uses a plasmonic solid immersion lens (SIL) optical head which consists of a SIL and a sharp-ridge nanoaperture for a high strong nanometer-size optical spot. According to the use of the evanescent field generated from SIL for near-field active air-gap control, the plasmonic SIL can fly ~20 nm above a photoresist-coated Si-wafer that moves at speed of 0 ~ 200 mm/s and perform the line patterning with nanometer-size width. We have experimentally demonstrated patterning with a line width (full width at half magnitude: FWHM) of ~130 nm.

Original languageEnglish
Title of host publicationJoint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011
PublisherOptical Society of American (OSA)
ISBN (Print)9781557529152
Publication statusPublished - 2011
EventJoint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011 - Kauai, HI, United States
Duration: 2011 Jul 172011 Jul 20

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherJoint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011
CountryUnited States
CityKauai, HI
Period11/7/1711/7/20

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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