Applications of atomic layer deposition to nanofabrication and emerging nanodevices

Hyungjun Kim, Han Bo Ram Lee, W. J. Maeng

Research output: Contribution to journalReview article

396 Citations (Scopus)

Abstract

Recently, with scaling down of semiconductor devices, need for nanotechnology has increased enormously. For nanoscale devices especially, each of the layers should be as thin and as perfect as possible. Thus, the application of atomic layer deposition (ALD) to nanofabrication strategies and emerging nanodevices has sparked a good deal of interest due to its inherent benefits compared to other thin film deposition techniques. Since the ALD process is intrinsically atomic in nature and results in the controlled deposition of films at the atomic scale, ALD produces layers with nanometer scale thickness control and excellent conformality. In this report, we review current research trends in ALD processes, focusing on the application of ALD to emerging nanodevices utilizing fabrication through nanotechnology.

Original languageEnglish
Pages (from-to)2563-2580
Number of pages18
JournalThin Solid Films
Volume517
Issue number8
DOIs
Publication statusPublished - 2009 Feb 27

Fingerprint

Atomic layer deposition
nanofabrication
atomic layer epitaxy
Nanotechnology
emerging
nanotechnology
Thickness control
Semiconductor devices
semiconductor devices
trends
scaling
Fabrication
Thin films
fabrication
thin films

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Kim, Hyungjun ; Lee, Han Bo Ram ; Maeng, W. J. / Applications of atomic layer deposition to nanofabrication and emerging nanodevices. In: Thin Solid Films. 2009 ; Vol. 517, No. 8. pp. 2563-2580.
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Applications of atomic layer deposition to nanofabrication and emerging nanodevices. / Kim, Hyungjun; Lee, Han Bo Ram; Maeng, W. J.

In: Thin Solid Films, Vol. 517, No. 8, 27.02.2009, p. 2563-2580.

Research output: Contribution to journalReview article

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