Arsenic-doped Si(001) gas-source molecular-beam epitaxy: Growth kinetics and transport properties

J. A.N.T. Soares, H. Kim, G. Glass, P. Desjardins, J. E. Greene

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Arsenic-doped Si(001) layers with concentrations CAs up to 5×1018cm-3 were grown on Si(001)2×1 at temperatures Ts=575-900°C by gas-source molecular-beam epitaxy (GS-MBE) using Si2H6 and AsH3. This is almost an order of magnitude higher than the initially reported "maximum attainable" saturated CAs value for GS-MBE from hydride precursors. At constant JAsH3/JSi2H6. CAs decreases, while the film growth rate RSi increases, with Ts. Temperature programmed desorption measurements show that As segregates strongly to the growth surface and that the observed decrease in CAs at high film growth temperatures is primarily due to increasingly rapid arsenic desorption from the segregated layer. Decreasing Ts enhances As incorporation. However, it also results in lower film growth rates due to higher steady-state As surface coverages which, because of the lone-pair electrons associated with each As adatom, decrease the total dangling bond coverage and, hence, the Si2H6 adsorption rate. At constant Ts, CAs increases, while RSi decreases, with increasing JAsH3/JSi2H6. All incorporated As resides at substitutional electrically active sites for concentrations up to 3.8×1018cm-3, the highest value yet reported for Si(001):As growth from hydride source gases, and temperature-dependent electron mobilities are equal to those of the best bulk Si: As.

Original languageEnglish
Pages (from-to)1290-1292
Number of pages3
JournalApplied Physics Letters
Volume74
Issue number9
DOIs
Publication statusPublished - 1999 Mar 1

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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