Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

Research output: Contribution to journalArticlepeer-review

477 Citations (Scopus)
Original languageEnglish
Pages (from-to)2231-2261
Number of pages31
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
DOIs
Publication statusPublished - 2003

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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