Abstract
The requirements of low power consumption and fast operation have necessitated the development of thin film transistors (TFTs) with exploration of new dielectric materials. Here, the unprecedented integration of high-κ dielectric CaCu3Ti4O12 is reported, yielding significant enhancements in the performance of amorphous InGaZnO TFTs. Using a multilayer structured amorphous Al2O3/CaCu3Ti4O12/Al2O3 dielectric configuration, the performance of the transistors is greatly improved as highlighted with high saturation mobility ('10 cm2 Vs−1), high on/off current ratio (3.8 × 107), low threshold voltage (≈0.51 V), and low subthreshold swing (≈0.45 V decade−1). The balanced performance enhancements are attributed to the lower density of interfacial/bulk trap states and sufficient band offsets.
Original language | English |
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Article number | 1900322 |
Journal | Advanced Electronic Materials |
Volume | 5 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2019 Oct 1 |
Bibliographical note
Funding Information:Y.S.J., C.S.H., and B.C.M. contributed equally to this work. This work was financially supported by grants from the National Research Foundation of Korea (NRF-2016M3A7B4910151), the Industrial Strategic Technology Development Program (#10079981), and the Korea Institute of Energy Technology Evaluation and Planning (No. 20173010013340) funded by the Ministry of Trade, Industry & Energy (MOTIE) of Korea.
Publisher Copyright:
© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials