Beam alignment for scanning beam interference lithography

Carl G. Chen; Ralf K. Heilmann; Chulmin Joo; Paul T. Konkola; G. S. Pati; Mark L. Schattenburg

doi:10.1116/1.1523402

Beam alignment for scanning beam interference lithography

Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Paul T. Konkola, G. S. Pati, Mark L. Schattenburg

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

A system for carrying out automated beam alignment for scanning beam interference lithography (SBIL) was described. A mathematical formalism was developed to describe the iterative beam alignment principle, which can be used to guide the design of such systems. Repeatability experiments show that the system can align the mean beam angle and position to tolerances of ≪10 μrad and ∼10 μm. This fulfills the alignment requirements for nanometer-level SBIL writing.

Original language	English
Pages (from-to)	3071-3074
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	20
Issue number	6
DOIs	https://doi.org/10.1116/1.1523402
Publication status	Published - 2002 Nov

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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abstract = "A system for carrying out automated beam alignment for scanning beam interference lithography (SBIL) was described. A mathematical formalism was developed to describe the iterative beam alignment principle, which can be used to guide the design of such systems. Repeatability experiments show that the system can align the mean beam angle and position to tolerances of ≪10 μrad and ∼10 μm. This fulfills the alignment requirements for nanometer-level SBIL writing.",

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AU - Chen, Carl G.

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AU - Joo, Chulmin

AU - Konkola, Paul T.

AU - Pati, G. S.

AU - Schattenburg, Mark L.

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Beam alignment for scanning beam interference lithography

Abstract

All Science Journal Classification (ASJC) codes

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