Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition

Whang Je Woo, Il Kwon Oh, Bo Eun Park, Youngjun Kim, Jongseo Park, Seunggi Seo, Jeong Gyu Song, Hanearl Jung, Donghyun Kim, Jun Hyung Lim, Sunhee Lee, Hyungjun Kim

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Engineering & Materials Science

Chemical Compounds

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